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• W3214794490 abstract "Abstract The method to optimize nanostructures of silicon thin films as thermoelectric materials is developed. The simulated annealing method is utilized for predicting the optimized structure. The mean free path and thermal conductivity of thin films, which are the objective function of optimization, is evaluated by using phonon transport simulations and lattice dynamics calculations. In small systems composed of square lattices, the simulated annealing method successfully predicts optimized structure corroborated by an exhaustive search. This fact indicates that the simulated annealing method is an effective tool for optimizing nanostructured thin films as thermoelectric materials." @default.
• W3214794490 created "2021-12-06" @default.
• W3214794490 creator A5027852591 @default.
• W3214794490 date "2021-11-22" @default.
• W3214794490 modified "2023-10-10" @default.
• W3214794490 title "Structural optimization of silicon thin film for thermoelectric materials" @default.
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• W3214794490 doi "https://doi.org/10.1038/s41598-021-01855-6" @default.
• W3214794490 hasPubMedCentralId "https://www.ncbi.nlm.nih.gov/pmc/articles/8608789" @default.
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• W3214794490 hasPublicationYear "2021" @default.
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