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• W330312857 abstract "Most micron and sub-micron production processes are based on a top-down approach, with lithography being an essential tool for patterning surfaces with high throughput. When reaching the sub 100 nm regime, photolithography becomes more expensive and the process gets complicated. This trend tends to increase much more when proceeding to the sub 30 nm range. We present a method that is based on Magnetolithography (ML). ML is a “bottom-up” method but at the same time, it provides desired high throughput capabilities for mass production. It is based on applying a magnetic field on the substrate using paramagnetic metal masks that define the spatial distribution and shape of the applied field. The second component in ML is ferromagnetic nanoparticles that are assembled onto the substrate according to the field induced by the mask. Following the deposition of the nanoparticles, metal evaporation can take place, followed my removal of the nanoparticles. Hence, instead of photoresist patterning, in the present technology magnetic nano particles are used for blocking areas on the wafer. ML has several special properties. It can be used both in “front” or “back” configuration. Namely the mask can be posited either on top or below the wafer. The resolution that can be achieved is better than the resolution of the lines in the mask, since the magnetic field induced by the lines is not constant and it is stronger at the center of the line. Hence the nanopartilces are derived towards the maximum magnetic field and form features that are thinner than the lines in the mask. We were able to pattern lines with 30 nm width using very simple methods and mask that was prepared by photolithography with a resolution of 1 micron. The patterning can be performed also on non-flat surfaces or inside a tube. In addition, by using “dynamic mask” it is possible to perform several stages of lithography with no need to realign the mask in each stage." @default.
• W330312857 created "2016-06-24" @default.
• W330312857 creator A5026943724 @default.
• W330312857 creator A5030264946 @default.
• W330312857 date "2010-01-01" @default.
• W330312857 modified "2023-09-27" @default.
• W330312857 title "Magnetolithography" @default.
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• W330312857 doi "https://doi.org/10.1016/b978-0-12-381312-1.00001-8" @default.
• W330312857 hasPublicationYear "2010" @default.
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