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- W33690698 abstract "The SiOC films were deposited with the variation of flow rate ratios by chemical vapor deposition. It was researched the reason of decreasing the dielectric constant in SiOC film and the relationship between the dielectric constant and the thickness. The thickness of the deposited films tends to in proportion to the refractive index and the sample with the lowest dielectric constant decreased the thickness. The refractive index was decreased after annealing because of the decreasing of the film's thickness by annealing process." @default.
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- W33690698 date "2009-01-01" @default.
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- W33690698 title "Correlation between the Thickness and Variation of Dielectric Conatant on SiOC thin film" @default.
- W33690698 hasPublicationYear "2009" @default.
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