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- W3375930 abstract "In this paper, barrier height between Ni-silicide and source/drain is reduced utilizing Pd stacked structure (Pd/Ni/TiN) for high performance PMOSFET. It is shown that the barrier height is decreased by Pd incorporation and is dependent on the Pd thickness. Therefore, Ni-silicide using the Pd stacked structure is promising for high performance nano-cale PMOSFET." @default.
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- W3375930 date "2009-06-01" @default.
- W3375930 modified "2023-10-18" @default.
- W3375930 title "Reduction of Barrier Height between Ni-silicide and p+ Source/drain for High Performance PMOSFET" @default.
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- W3375930 doi "https://doi.org/10.4313/jkem.2009.22.6.457" @default.
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