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- W35137779 abstract "Many technologies have been examined over the past several years with respect to the commercial production of low cost, high-efficiency silicon single crystal solar cells by easily automatable processing procedures. Among these, the process which uses silica-based spin-on or spray-on coatings to form the diffused n/sup +/p junction along with screen printed silver-aluminum pastes for the front and back contacts appears very attractive. The success of such a process depends upon reducing the number and complexity of the processing steps. In this paper, the authors report on a new planar junction formation technology which permits the junction to be diffused in a controlled fashion, away from the edge of the silicon wafer. This avoids subsequent processing to eliminate junction edge leakage currents. This process, in conjunction with a screen printing of Ag contacts on the front and Ag-Al contacts on the back, yields cells, in a production mode, with average efficiencies of 14% (15.7% active area)." @default.
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- W35137779 date "1984-05-01" @default.
- W35137779 modified "2023-09-27" @default.
- W35137779 title "A new planar junction technology for 100MM diameter silicon solar cells" @default.
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