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• W355984693 endingPage "06FM05" @default.
• W355984693 startingPage "06FM05" @default.
• W355984693 abstract "Room temperature (RT) nanoimprinting is an attractive technique for nanofabrication, because it is not required a thermal cycle or UV irradiation process. Previously, it has reported that RT-nanoimprinting enables the fabrication of nanostructures using hydrogen silsesquioxane (HSQ) as a resin. HSQ has the HSiO3/2 structure and transforms to SiOx, such as glass, upon annealing. We developed, for the first time, reversal nanoimprint using RT nanoimprint to fabricate a three-dimensional (3D) HSQ structure and succeeded in fabricating a 3D HSQ nanostructure with two cross-stacked layers. Furthermore, it was confirmed that the 3D HSQ structure has a sufficient interface adhesion between the upper and lower layers by a durability test using ultrasonic vibration and also that it was not deformed after an annealing treatment at 1000 °C." @default.
• W355984693 created "2016-06-24" @default.
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• W355984693 date "2015-05-22" @default.
• W355984693 modified "2023-09-26" @default.
• W355984693 title "Three-dimensional hydrogen silsesquioxane nanostructure fabrication by reversal room-temperature nanoimprint using poly(dimethylsiloxane) mold" @default.
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• W355984693 doi "https://doi.org/10.7567/jjap.54.06fm05" @default.
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