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- W375968 abstract "The composition and extent of Si(111) MOS interface regions have been probed following in situ growth using electron spectroscopies excited with soft X-ray synchrotron radiation. Our 2p core electron photoemission shows that Si2O-type bonds bridge Si(111) to SiO2. For non-abrupt interfaces (>3.85 A wide), a unique SiO layer is present which contains negligible SiO4 tetrahedra as characterized by Si(2p) CFS-photoyield. For Al contacts to SiO2, Al2O3 grows at the interface by reducing SiOx (x<2), The liberated oxygen first bonds within the Al overlayer in an intermediate aluminum-oxide configuration of three Al atoms bound to each surface O. In contrast, Au forms islands on SiO2 with evidence of Au-Si bonding." @default.
- W375968 created "2016-06-24" @default.
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- W375968 date "1980-01-01" @default.
- W375968 modified "2023-09-26" @default.
- W375968 title "CHEMICAL BONDING AT METAL/SiO2/Si(111) INTERFACES" @default.
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- W375968 doi "https://doi.org/10.1016/b978-0-08-025969-7.50046-4" @default.
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