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- W4200341509 endingPage "2106110" @default.
- W4200341509 startingPage "2106110" @default.
- W4200341509 abstract "2D van der Waals (vdW) materials have been considered as potential building blocks for use in fundamental elements of electronic and optoelectronic devices, such as electrodes, channels, and dielectrics, because of their diverse and remarkable electrical properties. Furthermore, two or more building blocks of different electronic types can be stacked vertically to generate vdW heterostructures with desired electrical behaviors. However, such fundamental approaches cannot directly be applied practically because of issues such as precise alignment/positioning and large-quantity material production. Here, these limitations are overcome and wafer-scale vdW heterostructures are demonstrated by exploiting the lateral and vertical assembly of solution-processed 2D vdW materials. The high exfoliation yield of the molecular intercalation-assisted approach enables the production of micrometer-sized nanosheets in large quantities and its lateral assembly in a wafer-scale via vdW interactions. Subsequently, the laterally assembled vdW thin-films are vertically assembled to demonstrate various electronic device applications, such as transistors and photodetectors. Furthermore, multidimensional vdW heterostructures are demonstrated by integrating 1D carbon nanotubes as a p-type semiconductor to fabricate p-n diodes and complementary logic gates. Finally, electronic devices are fabricated via inkjet printing as a lithography-free manner based on the stable nanomaterial dispersions." @default.
- W4200341509 created "2021-12-31" @default.
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- W4200341509 date "2022-02-08" @default.
- W4200341509 modified "2023-10-17" @default.
- W4200341509 title "All‐Solution‐Processed Van der Waals Heterostructures for Wafer‐Scale Electronics" @default.
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- W4200341509 cites W1832666745 @default.
- W4200341509 cites W1861856245 @default.
- W4200341509 cites W1890982838 @default.
- W4200341509 cites W1927456795 @default.
- W4200341509 cites W1965262278 @default.
- W4200341509 cites W1975192769 @default.
- W4200341509 cites W1976926775 @default.
- W4200341509 cites W1990314543 @default.
- W4200341509 cites W1992506968 @default.
- W4200341509 cites W1994461548 @default.
- W4200341509 cites W1996162207 @default.
- W4200341509 cites W1999345742 @default.
- W4200341509 cites W2002773120 @default.
- W4200341509 cites W2010289698 @default.
- W4200341509 cites W2010959282 @default.
- W4200341509 cites W2017871657 @default.
- W4200341509 cites W2020823358 @default.
- W4200341509 cites W2021994802 @default.
- W4200341509 cites W2023249057 @default.
- W4200341509 cites W2039211361 @default.
- W4200341509 cites W2040077883 @default.
- W4200341509 cites W2040287492 @default.
- W4200341509 cites W2058122340 @default.
- W4200341509 cites W2071998162 @default.
- W4200341509 cites W2085537249 @default.
- W4200341509 cites W2089592248 @default.
- W4200341509 cites W2092044679 @default.
- W4200341509 cites W2096421416 @default.
- W4200341509 cites W2099591293 @default.
- W4200341509 cites W2108102346 @default.
- W4200341509 cites W2115786064 @default.
- W4200341509 cites W2122070625 @default.
- W4200341509 cites W2125612486 @default.
- W4200341509 cites W2159078685 @default.
- W4200341509 cites W2163980958 @default.
- W4200341509 cites W2167267527 @default.
- W4200341509 cites W2170539287 @default.
- W4200341509 cites W2211067978 @default.
- W4200341509 cites W2236962144 @default.
- W4200341509 cites W2262551658 @default.
- W4200341509 cites W2275940562 @default.
- W4200341509 cites W2307514474 @default.
- W4200341509 cites W2314819488 @default.
- W4200341509 cites W2337465360 @default.
- W4200341509 cites W2468666903 @default.
- W4200341509 cites W2469075463 @default.
- W4200341509 cites W2475096219 @default.
- W4200341509 cites W2481949062 @default.
- W4200341509 cites W2569632834 @default.
- W4200341509 cites W2581450533 @default.
- W4200341509 cites W2582156391 @default.
- W4200341509 cites W2592160648 @default.
- W4200341509 cites W2604126682 @default.
- W4200341509 cites W2610861837 @default.
- W4200341509 cites W2798223061 @default.
- W4200341509 cites W2799599026 @default.
- W4200341509 cites W2804762466 @default.
- W4200341509 cites W2809954479 @default.
- W4200341509 cites W2887446748 @default.
- W4200341509 cites W2893616744 @default.
- W4200341509 cites W2894645292 @default.
- W4200341509 cites W2902215586 @default.
- W4200341509 cites W2940968017 @default.
- W4200341509 cites W2974623595 @default.
- W4200341509 cites W3041364443 @default.
- W4200341509 cites W3101223577 @default.
- W4200341509 cites W3105489360 @default.
- W4200341509 cites W3112668954 @default.
- W4200341509 cites W3123709910 @default.
- W4200341509 cites W3136251783 @default.
- W4200341509 cites W3174111621 @default.
- W4200341509 cites W3175149747 @default.
- W4200341509 cites W4236533514 @default.
- W4200341509 doi "https://doi.org/10.1002/adma.202106110" @default.
- W4200341509 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/34933395" @default.
- W4200341509 hasPublicationYear "2022" @default.
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