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- W4200492055 abstract "There are several methods of fabricating nanogaps with controlled spacings, but the precise control over the sub-nanometer spacing between two electrodes-and generating them in practical quantities-is still challenging. The preparation of nanogap electrodes using nanoskiving, which is a form of edge lithography, is a fast, simple and powerful technique. This method is an entirely mechanical process which does not include any photo- or electron-beam lithographic steps and does not require any special equipment or infrastructure such as clean rooms. Nanoskiving is used to fabricate electrically addressable nanogaps with control over all three dimensions; the smallest dimension of these structures is defined by the thickness of the sacrificial layer (Al or Ag) or self-assembled monolayers. These wires can be manually positioned by transporting them on drops of water and are directly electrically-addressable; no further lithography is required to connect them to an electrometer." @default.
- W4200492055 created "2021-12-31" @default.
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- W4200492055 date "2013-05-13" @default.
- W4200492055 modified "2023-09-24" @default.
- W4200492055 title "Fabricating Nanogaps by Nanoskiving" @default.
- W4200492055 doi "https://doi.org/10.3791/50406-v" @default.
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