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- W4205157089 abstract "The dislocation properties of γ-TiAl are systematically investigated under the effect of impurities with semi-discrete variational Peierls-Nabarro (SDVPN) model. The impurities prefer to locating at the first layer below the stacking fault plane along 1/2<112‾] which is attributed to the local effect between stacking fault and impurities by local energy scheme analysis. The dislocation dissociation width of γ-TiAl is 1.58 Å, which shows a compact core character and is well consistent with that by atomic simulation and experimental observation. Negligible changes occur in the dislocation dissociation width as C or O is doped, while the dislocation does not even dissociate with N or H addition. The Peierls stress is reduced and the dislocation mobility is improved by N, H, and O, while C takes an opposite effect. The improved dislocation mobility with H is consistent with the enhanced dislocation mobility by H in experiments, while the improved dislocation mobility with O in calculation excludes the dislocation pinning effect of oxygen in solution." @default.
- W4205157089 created "2022-01-25" @default.
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- W4205157089 date "2022-03-01" @default.
- W4205157089 modified "2023-10-16" @default.
- W4205157089 title "The effect of impurities on stacking fault energy and dislocation properties in γ-TiAl" @default.
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- W4205157089 doi "https://doi.org/10.1016/j.vacuum.2021.110866" @default.
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