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- W4206258168 abstract "Anomalous NMOS HCI degradation has been reported on logic IC and NAND. This paper presents for the first time its occurrence on DRAM. It also shows the trade-off between DRAM retention and peripheral circuit HCI related reliability. The underlying mechanism is fully verified through systemic investigation on electrical characteristics including the subthreshold leakage increasing and recovery, DIBL worsening, and different IDS degradation behavior in linear and saturation regions. These interesting behaviors are strongly process dependent and associated with interface state generation. This work provides some ideas to minimize the anomalous degradation risk." @default.
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- W4206258168 date "2021-11-24" @default.
- W4206258168 modified "2023-09-26" @default.
- W4206258168 title "Anomalous NMOSFET hot carrier degradation on DRAM" @default.
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- W4206258168 doi "https://doi.org/10.1109/icta53157.2021.9661707" @default.
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