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- W4210897809 abstract "The physical and mechanical properties of Cr(30 nm)/Cu(30 nm)/Ni(30 nm) thin filmsThin films magnetron sputtered on Si (001) were studied. A novel microtribological tests have been proposed to evaluate the wear resistance and adhesionAdhesion of the thin films. Microtribological characteristics such as coefficient of friction, wear resistance, and adhesionAdhesion were quantified for samples in the as-deposited state and also after their low-energy (1000 eV) Ar+ ion irradiationIon irradiation, after annealing at 450 °C in vacuum for 15 min, and finally after their combined treatment when the ion irradiationIon irradiation followed by the annealing. The best microtribological properties among all the samples tested were demonstrated by thin-filmsThin-films after their combined treatment. The results of the SIMS depth profile show that the diffusion redistribution of the major components over the entire depth of the film occurs after annealing. After ion bombardment, the redistribution of the main components was not observed, but the chemistry of the close surface layer was modified by the introduced Ar. The result of the combined treatment (ion bombardment + annealing) showed that chemical modification occurs in the surface layer and mainly in Ar, while the total distribution of the main components over the depth of the film is similar to the case of annealed sample. The improvement in thin-filmThin-films mechanical properties was explained by their surface hardening associated with dislocation dynamics modified by the implanted argon ions. Therefore, pre-irradiation with ions can be recommended for long-termLong-term stability stability of Cu-based thin-filmThin-films metal contacts for new generation solar cells that are exposed to elevated temperatures." @default.
- W4210897809 created "2022-02-09" @default.
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- W4210897809 date "2022-01-01" @default.
- W4210897809 modified "2023-10-01" @default.
- W4210897809 title "Multi-layered Thin-Film Metal Contacts for New Generation Solar Cells" @default.
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- W4210897809 doi "https://doi.org/10.1007/978-3-030-92381-5_39" @default.
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