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• W4220796510 endingPage "14692" @default.
• W4220796510 startingPage "14677" @default.
• W4220796510 abstract "Tuning ion energies in plasma-enhanced atomic layer deposition (PEALD) processes enables fine control over the material properties of functional coatings. The growth, structural, mechanical, and optical properties of HfO2 thin films are presented in detail toward photonic applications. The influence of the film thickness and bias value on the properties of HfO2 thin films deposited at 100 °C using tetrakis(dimethylamino)hafnium (TDMAH) and oxygen plasma using substrate biasing is systematically analyzed. The HfO2 films deposited without a substrate bias show an amorphous microstructure with a low density, low refractive index, high incorporation of residual hydroxyl (OH) content, and high residual tensile stress. The material properties of HfO2 films significantly improved at a low bias voltage due to the interaction with oxygen ions accelerated to the film. Such HfO2 films have a higher density, higher refractive index, and lower residual OH incorporation than films without bias. The mechanical stress becomes compressive depending on the bias values. Further increasing the ion energies by applying a larger substrate bias results in a decrease of the film density, refractive index, and a higher residual OH incorporation as well as crystalline inclusions. The comparable material properties of the HfO2 films have been reported using tris(dimethylamino)cyclopentadienyl hafnium (TDMACpH) in a different apparatus, indicating that this approach can be transferred to various systems and is highly versatile. Finally, the substrate biasing technique has been introduced to deposit stress-compensated, crack- and delamination-free high-reflective (HR) mirrors at 355 and 532 nm wavelengths using HfO2 and SiO2 as high and low refractive index materials, respectively. Such mirrors could not be obtained without the substrate biasing during the deposition because of the high tensile stress of HfO2, leading to cracks in thick multilayer systems. An HR mirror for 532 nm wavelength shows a high reflectance of 99.93%, a residual transmittance of ∼530 ppm, and a low absorption of ∼11 ppm, as well as low scattering losses of ∼4 ppm, high laser-induced damage threshold, low mechanical stress, and high environmental stability." @default.
• W4220796510 created "2022-04-03" @default.
• W4220796510 creator A5001266754 @default.
• W4220796510 creator A5009686318 @default.
• W4220796510 creator A5018346857 @default.
• W4220796510 creator A5021611388 @default.
• W4220796510 creator A5030118300 @default.
• W4220796510 creator A5030203005 @default.
• W4220796510 creator A5038795938 @default.
• W4220796510 creator A5040306739 @default.
• W4220796510 creator A5045275568 @default.
• W4220796510 creator A5047223237 @default.
• W4220796510 creator A5054661025 @default.
• W4220796510 creator A5055424163 @default.
• W4220796510 creator A5058961164 @default.
• W4220796510 creator A5073872018 @default.
• W4220796510 creator A5075103014 @default.
• W4220796510 creator A5081253257 @default.
• W4220796510 date "2022-03-21" @default.
• W4220796510 modified "2023-10-16" @default.
• W4220796510 title "Plasma-Enhanced Atomic Layer Deposition of HfO₂ with Substrate Biasing: Thin Films for High-Reflective Mirrors" @default.
• W4220796510 cites W110979913 @default.
• W4220796510 cites W149105843 @default.
• W4220796510 cites W1646998796 @default.
• W4220796510 cites W1849058248 @default.
• W4220796510 cites W1939833618 @default.
• W4220796510 cites W1941864585 @default.
• W4220796510 cites W1963606831 @default.
• W4220796510 cites W1964753392 @default.
• W4220796510 cites W1969352504 @default.
• W4220796510 cites W1972298273 @default.
• W4220796510 cites W1981414979 @default.
• W4220796510 cites W1996746479 @default.
• W4220796510 cites W1997276028 @default.
• W4220796510 cites W2001064464 @default.
• W4220796510 cites W2001220075 @default.
• W4220796510 cites W2003645630 @default.
• W4220796510 cites W2015976778 @default.
• W4220796510 cites W2028731941 @default.
• W4220796510 cites W20295568 @default.
• W4220796510 cites W2034339844 @default.
• W4220796510 cites W2038491180 @default.
• W4220796510 cites W2038868971 @default.
• W4220796510 cites W2042150892 @default.
• W4220796510 cites W2047342897 @default.
• W4220796510 cites W2062238054 @default.
• W4220796510 cites W2067285151 @default.
• W4220796510 cites W2069512977 @default.
• W4220796510 cites W2075726527 @default.
• W4220796510 cites W2077926730 @default.
• W4220796510 cites W2079925173 @default.
• W4220796510 cites W2084090530 @default.
• W4220796510 cites W2086477409 @default.
• W4220796510 cites W2089653545 @default.
• W4220796510 cites W2091811066 @default.
• W4220796510 cites W2092746093 @default.
• W4220796510 cites W2113239004 @default.
• W4220796510 cites W2115541803 @default.
• W4220796510 cites W2117517212 @default.
• W4220796510 cites W2134869306 @default.
• W4220796510 cites W2149248689 @default.
• W4220796510 cites W2150086086 @default.
• W4220796510 cites W2163012862 @default.
• W4220796510 cites W2167314707 @default.
• W4220796510 cites W2173341741 @default.
• W4220796510 cites W2175961259 @default.
• W4220796510 cites W2176156470 @default.
• W4220796510 cites W2186197231 @default.
• W4220796510 cites W2259854149 @default.
• W4220796510 cites W2259928185 @default.
• W4220796510 cites W2480492474 @default.
• W4220796510 cites W2483517365 @default.
• W4220796510 cites W2494350585 @default.
• W4220796510 cites W2550675233 @default.
• W4220796510 cites W2551852834 @default.
• W4220796510 cites W2565827167 @default.
• W4220796510 cites W2575883344 @default.
• W4220796510 cites W2594777354 @default.
• W4220796510 cites W2605241886 @default.
• W4220796510 cites W2762588855 @default.
• W4220796510 cites W2767004806 @default.
• W4220796510 cites W2786043807 @default.
• W4220796510 cites W2789517172 @default.
• W4220796510 cites W2790150426 @default.
• W4220796510 cites W2794397652 @default.
• W4220796510 cites W2795432037 @default.
• W4220796510 cites W2799767796 @default.
• W4220796510 cites W2805602582 @default.
• W4220796510 cites W2889356481 @default.
• W4220796510 cites W2898428328 @default.
• W4220796510 cites W2901297356 @default.
• W4220796510 cites W2904303225 @default.
• W4220796510 cites W2909333725 @default.
• W4220796510 cites W2914501300 @default.
• W4220796510 cites W2921912966 @default.
• W4220796510 cites W2931684697 @default.
• W4220796510 cites W2966392561 @default.
• W4220796510 cites W2980918277 @default.

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