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- W4220995810 abstract "This chapter presents a simulation-based optimization methodology for tunnel field-effect transistor (TFET) design. As doping across various regions significantly affects device performance, the influence of the doping profile variation is studied in this chapter. The main goal is to maximize the current ratio by doping profile optimization keeping other parameters fixed. The hybrid optimization technique makes use of a combination of the evolutionary algorithm and swarm intelligence–based techniques. The performances of the algorithms are then validated by performing complexity, convergence, and accuracy analysis. Further, the accuracy of the model is validated by re-simulating the device in TCAD and comparing it with the hit-and-trial-based device performance. This technique outperforms the state-of-the-art design techniques and provides the best accuracy along with exceptional computational efficiency." @default.
- W4220995810 created "2022-04-03" @default.
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- W4220995810 date "2022-03-26" @default.
- W4220995810 modified "2023-10-14" @default.
- W4220995810 title "Hybrid Intelligent Technique-Based Doping Profile Optimization in a Double-Gate Hetero-Dielectric TFET" @default.
- W4220995810 doi "https://doi.org/10.1201/9781003126393-16" @default.
- W4220995810 hasPublicationYear "2022" @default.
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