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• W4224434469 abstract "Nickel oxide (NiOx), a typical p-type semiconductor, is emerging as the most promising hole transport layer material. However, the inferior interfacial contact of the NiOx/perovskite interface has limited the improvement of the performance of photodetectors (PDs). In this work, 2,3,5,6-tetrafluoro-7,7,8,8-tetracyanoquinodimethane (F4-TCNQ) is introduced to modify the NiOx/perovskite interface to prepare high-performance PDs. This study shows that the F4-TCNQ layer interacts with the NiOx/perovskite layers. It can increase the Ni3+/Ni2+ ratio and then enhance the hole extraction and charge carrier mobility; on the contrary, it can form a new Lewis adduct and passivate the undercoordinated Pb2+ ions. Furthermore, with the F4-TCNQ modification, the perovskite film exhibits good thermal stability and photostability. The PDs demonstrate excellent photoelectric properties and long-term stability in the atmosphere. This finding provides a simple and efficient way to further develop the NiOx/perovskite interface." @default.
• W4224434469 created "2022-04-27" @default.
• W4224434469 creator A5006829574 @default.
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• W4224434469 date "2022-04-26" @default.
• W4224434469 modified "2023-10-16" @default.
• W4224434469 title "High-Efficiency and Stable Perovskite Photodetectors with an F4-TCNQ-Modified Interface of NiO_<i>x</i> and Perovskite Layers" @default.
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• W4224434469 doi "https://doi.org/10.1021/acs.jpclett.2c00860" @default.
• W4224434469 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/35471973" @default.
• W4224434469 hasPublicationYear "2022" @default.
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