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- W4224913926 abstract "• WO 3 :Al films (0.7–4.3 at%) were prepared by RF Magnetron Sputtering. • W ions exist in the 6+ valence. • Al doping did not adversely affect the transparency of WO 3 films. • 1.5% Al doped WO 3 sample showed the highest optical modulation of 44%. Effect of Al doping on the structural, optic, and electrochromic properties of tungsten trioxide (WO 3 ) thin films was investigated through X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy, atomic force microscopy, optic transmittance, spectral ellipsometry, cyclic voltammetry and chronoamperometry measurements. Undoped and 0.7–4.3% Al doped WO 3 films were grown by radio frequency magnetron sputtering. All of the WO 3 :Al films investigated grew in amorphous phase. The thicknesses of the films varied between 113 and 124 nm. X-ray photoelectron spectroscopy analysis indicated that tungsten atoms exist as W 6+ in both undoped and Al doped WO 3 films. The optical transmittance of WO 3 films is not affected by the Al doping. Their transparency in the visible range is around 90% while the transmittance in the near infrared region seems to slightly increase (around 5%) with increasing Al doping. The optical band gap energies increase with Al doping concentrations exceeding 1.5%. Variation of the coloration / bleaching times and coloration efficiency of the WO 3 films with Al doping was analyzed. The highest optical modulation of 44% was obtained for 1.5% Al doped WO 3 film at 630 nm." @default.
- W4224913926 created "2022-04-27" @default.
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- W4224913926 date "2022-06-01" @default.
- W4224913926 modified "2023-10-10" @default.
- W4224913926 title "Effect of Al doping on the electrochromic properties of WO3 thin films" @default.
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- W4224913926 doi "https://doi.org/10.1016/j.tsf.2022.139241" @default.
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