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- W4229451857 abstract "This work presents the effects of silicon film thickness on analog performance on a FDSOI transistor. The increase of silicon film thickness leads to higher carrier mobility with possible impact on electrostatic control. The optimum condition has been identified for T <inf xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>Si</inf> =16nm, with maximum mobility gain and -15% RTN noise reduction. Additionally, by connecting the front-gate and back-gate together, we show the possibility of further improving the intrinsic gain up to +36% and reducing the RTN noise by -45%." @default.
- W4229451857 created "2022-05-11" @default.
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- W4229451857 date "2022-04-18" @default.
- W4229451857 modified "2023-09-24" @default.
- W4229451857 title "Improved g<sub>m</sub> and RTN Device Performance using Thick SOI in 22FDX® for Analog Applications" @default.
- W4229451857 doi "https://doi.org/10.1109/vlsi-tsa54299.2022.9771046" @default.
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