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- W4229778850 abstract "Fluorine was impregnated at the Si-SiO2 interface by implanting fluorine ions (19F+) into silicon at low energy (20 keV) to a dose in the range 1011–1015 ions/cm2. Studies were carried out for two cases: first, silicon was oxidised in dry oxygen after 19F+ implantation and second, silicon was implanted with 19F+ after its oxidation to a 207 Å thick dry thermal oxide. In both the cases, high frequency capacitance-voltage (HF C-V) measurements show reduction in the midgap interface state density (Nss) nearly by one order of magnitude. Another important observation was that the incorporation of fluorine reduces the oxidation rate of silicon without deteriorating the interface properties." @default.
- W4229778850 created "2022-05-11" @default.
- W4229778850 date "1975-02-01" @default.
- W4229778850 modified "2023-09-26" @default.
- W4229778850 title "Electronic density of states of amorphous III–V semiconductors" @default.
- W4229778850 doi "https://doi.org/10.1016/0026-2714(75)90413-8" @default.
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