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- W4230323305 abstract "Metallic nanogaps are fundamental components of nanoscale photonic and electronic devices. However, the lack of reproducible high-yield fabrication methods with nanometric control over the gap-size has hindered practical applications. Here, we report a patterning technique based on molecular self-assembly and physical peeling that allows the gap-width to be tuned over the range 3 – 30 nm and enables the fabrication of massively parallel nanogap arrays containing hundreds of millions of ring-shaped nanogaps (RSNs). The method is used here to prepare molecular diodes across sub-3-nm metallic nanogaps and to fabricate visible-light-active plasmonic substrates based on large-area, gold-based RSN arrays. The substrates are applicable to a broad range of optical applications, and are used here as substrates for surface-enhanced Raman spectroscopy (SERS), providing high enhancement factors of up to 3e8 relative to similar, gap-free thin gold films." @default.
- W4230323305 created "2022-05-11" @default.
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- W4230323305 date "2020-10-30" @default.
- W4230323305 modified "2023-10-16" @default.
- W4230323305 title "Fabrication of Size-Controlled Metallic Nanogaps down to the Sub 3-Nm Level" @default.
- W4230323305 doi "https://doi.org/10.26434/chemrxiv.13158173" @default.
- W4230323305 hasPublicationYear "2020" @default.
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