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- W4231545455 abstract "We have developed a method for measuring the thickness of thin films that is nondestructive, noncontact and that can make measurements with 2-μm spatial resolution (i.e., 2-μm spot size) on both optically opaque as well as optically transparent films. With this method, which is based on the use of high-frequency thermal waves, thicknesses of Al and SiO2 films on Si substrates have been measured in the 500–25 000-Å range." @default.
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- W4231545455 date "1983-07-15" @default.
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- W4231545455 title "Thin-film thickness measurements with thermal waves" @default.
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- W4231545455 doi "https://doi.org/10.1063/1.94267" @default.
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