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• W4233824900 abstract "A high current metal ion source has been designed and successfully used for activated deposition. An ion beam of some amperes is produced by transporting the fully ionized plasma from a pulsed high current vacuum arc through a curved magnetic duct. Deposition rates of some ten nm per second can be achieved. The deposited layers are free of particles, holes and pits. Films of about 50 nm have been deposited homogeneously (thickness variation below 5%) on a 4 inch substrate after 300 pulses. Repetition rates are adjustable from more than 100 Hz down to single pulses in dependence on the acceptable thermal input. Several applications are described in the paper: (1) deposition of hard, amorphous carbon films; (2) droplet-free TiN films for advanced applications; (3) transparent Al/sub 2/O/sub 3/ protective coatings; and (4) metallization for microelectronics." @default.
• W4233824900 created "2022-05-12" @default.
• W4233824900 creator A5044444312 @default.
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• W4233824900 date "2002-11-27" @default.
• W4233824900 modified "2023-10-17" @default.
• W4233824900 title "Deposition of droplet-free films by vacuum arc evaporation-results and applications" @default.
• W4233824900 cites W1969203382 @default.
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• W4233824900 doi "https://doi.org/10.1109/deiv.1998.738784" @default.
• W4233824900 hasPublicationYear "2002" @default.
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