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- W4236442489 abstract "Ultrananocrystalline diamond (UNCD) is characterized by the dimensions of its ultra-nanoscale grains and is typically synthesized under high nucleation conditions using an argon-rich hydrogen/methane/argon gas mixture. UNCD films consist of crystalline grains of at least 95% sp3-bonded carbon that are 2-10 nm in size with a surface roughness ranging between 20 and 40 nm. UNCD films exhibit most of the outstanding properties of diamond such as an exceptional hardness, high mechanical strength, extremely low friction coefficient, chemical inertness, thermal stability and high electrical conductivity at room temperature when doped with nitrogen. While all these properties are intrinsic of the material, the required roughness scale of the UNCD film needs to be carefully tailored and customized on an application-by-application basis. For instance, a low roughness is key to manufacturing adequate micro-electromechanical systems (MEMS), wear-resistant low friction coatings, X-ray lithography masks and biomedical devices where stringent tolerance and topological precision are of utmost importance." @default.
- W4236442489 created "2022-05-12" @default.
- W4236442489 date "2016-01-01" @default.
- W4236442489 modified "2023-10-14" @default.
- W4236442489 title "Plasma Etching Chemistry for Smoothening Ofultrananocrystalline Diamond Films" @default.
- W4236442489 doi "https://doi.org/10.1149/ma2016-01/18/1076" @default.
- W4236442489 hasPublicationYear "2016" @default.
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