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- W4242097773 abstract "Using the method for calculating the band bending and concentration profiles of a multilevel impurity center in its different charge states within a semiconductor inhomogeneously doped with the impurity proposed in the preceding paper [X. Yang et al., Phys. Rev. B 53, 13 414 (1996)] to n-type GaP implanted with Ni and Fe ions, respectively, the results were obtained for the samples implanted and annealed under different conditions. Based on the results, a feasible explanation of the deep-level transient spectroscopy spectra of Ni ion-implanted n-type GaP was obtained and an analysis for the Mossbauer spectra of Fe ion-implanted n-type GaP was carried out. textcopyright{} 1996 The American Physical Society." @default.
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- W4242097773 date "1996-05-15" @default.
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- W4242097773 title "Band bending within inhomogeneously doped semiconductors with multilevel impurities. II. Examples" @default.
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