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- W4244131567 abstract "A model bilayer geometry is used to correlate the reaction front profile width with roughness after development in 0.26 N tetramethylammonium hydroxide aqueous base developer. The bilayer geometry utilizes a bottom layer of protected photoresist polymer with a top layer of deprotected photoresist loaded with photoacid generator. Neutron reflectivity measurements show that the reaction front profile broadens during post-exposure bake (PEB) times between 15 s and 90 s to a width approaching 150 Å. The subsequent development and atomic force microscopy experiments reveal an increase in nominal root-mean-squared (RMS) roughness as well as increased lateral length scale features with PEB time. While the form and size of the deprotection profile have been proposed as an important factor in line edge roughness (LER) formation, this study shows the connection of sidewall morphology to a measured deprotection profile." @default.
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- W4244131567 date "2004-02-07" @default.
- W4244131567 modified "2023-09-23" @default.
- W4244131567 title "Correlation of the Reaction Front with Roughness in Chemically Amplified Photoresists" @default.
- W4244131567 doi "https://doi.org/10.1021/bk-2004-0874.ch007" @default.
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