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- W4244263089 abstract "The initial growth of NiSi2 on Si(1 0 0) surfaces with a thin C layer by scanning tunneling microscopy has been investigated. The surface roughening with the formation of epitaxial NiSi2 domains is effectively suppressed even by the introduction of a submonolayer thick C layer. The reduction of an average size of epitaxial NiSi2 islands and the increase in the nucleation density of NiSi2 islands are caused by incorporating of C atoms into the surface before the 4.8-monolayer thick Ni deposition. The adsorption condition of C atoms on the surface more strongly influences the density and the average size of epitaxial NiSi2 islands rather than the total amount of deposited C atoms does." @default.
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- W4244263089 date "2004-10-15" @default.
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- W4244263089 title "Influence of C incorporation on the initial growth of epitaxial NiSi2 on Si(100)" @default.
- W4244263089 doi "https://doi.org/10.1016/s0169-4332(04)00980-8" @default.
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