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- W4244350504 abstract "Abstract This study introduces an in situ fabrication of nanoporous hematite with a Ti‐doped SiO x passivation layer for a high‐performance water‐splitting system. The nanoporous hematite with a Ti‐doped SiO x layer (Ti‐(SiO x /np‐Fe 2 O 3 )) has a photocurrent density of 2.44 mA cm −2 at 1.23 V RHE and 3.70 mA cm −2 at 1.50 V RHE . When a cobalt phosphate co‐catalyst was applied to Ti‐(SiO x /np‐Fe 2 O 3 ), the photocurrent density reached 3.19 mA cm −2 at 1.23 V RHE with stability, which shows great potential of the use of the Ti‐doped SiO x layer with a synergistic effect of decreased charge recombination, the increased number of active sites, and the reduced hole‐diffusion pathway from the hematite to the electrolyte." @default.
- W4244350504 created "2022-05-12" @default.
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- W4244350504 date "2016-06-30" @default.
- W4244350504 modified "2023-10-14" @default.
- W4244350504 title "A Titanium‐Doped SiO<sub><i>x</i></sub> Passivation Layer for Greatly Enhanced Performance of a Hematite‐Based Photoelectrochemical System" @default.
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- W4244350504 doi "https://doi.org/10.1002/ange.201603666" @default.
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