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- W4248654804 abstract "The effects of stirring on the bulk etch rate of LR 115 detector has been investigated. The surface profile measurement method using an instrument called Form Talysurf has been used to measure the thickness of the active layer of the LR 115 detectors. The etchant was 10% aqueous solution of NaOH maintained at 60°C. The bulk etch rate under magnetic stirring has been found to be 6.65±0.34μmh−1 and that under no stirring to be 3.61±0.14μmh−1. The initial thickness of the active layer before etching also varies." @default.
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- W4248654804 date "2003-06-01" @default.
- W4248654804 modified "2023-10-18" @default.
- W4248654804 title "Effects of stirring on the bulk etch rate of LR 115 detector" @default.
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- W4248654804 doi "https://doi.org/10.1016/s1350-4487(03)00045-3" @default.
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