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- W4249668346 abstract "Proximity-compensated kinoforms were manufactured with direct-writing electron-beam lithography in two different resists, SAL 110 and PMMA. The kinoforms were blazed transmission gratings, with periods 4, 8, 16 pm 1 mm by 1 mm size, and a Fresnel lens, with 38 mm focal length and 3 mm by 3 mm size. The compensated gratings performed better than the uncompensated ones: for the 4 pm compensated grating the measured diffraction efficiency was 67%. It was 35% for the uncompensated grating. The Fresnel lens had diffraction limited optical performance with better than 85% efficiency. The compensation was made by repeated convolutions in the spatial domain or deconvolution in the Fourier domain using the electron-beam point-spread function. We also present developing processes for PMMA and SAL 110 resists that are more appropriate for multilevel resist kinoforms manufactured with direct-write electron-beam lithography." @default.
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- W4249668346 date "1993-12-28" @default.
- W4249668346 modified "2023-10-06" @default.
- W4249668346 title "Proximity-compensated kinoforms directly written by e-beam lithography" @default.
- W4249668346 doi "https://doi.org/10.1117/12.170197" @default.
- W4249668346 hasPublicationYear "1993" @default.
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