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- W4250885053 abstract "The high degree of stability and beam purity characteristic of rf acceleration techniques have been well demonstrated with the Eaton NV-1000 ion implanter. The series has been extended to take fuller advantage of the high current capability of the technique. The NV-1002 will provide milliampère beams to energies of 2 MeV over a wide range of ion masses. In addition to the higher current capability, the new series will be smaller in size and incorporate the most recent Eaton end-station technology. The Eaton Advanced control system will be used in the automation of source, injector, linac and robotic end station." @default.
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- W4250885053 date "1992-04-01" @default.
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- W4250885053 title "Subject index of volume 51" @default.
- W4250885053 doi "https://doi.org/10.1016/0257-8972(92)90300-y" @default.
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