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- W4253162823 abstract "A novel system capable of making on-wafer Hall-effect measurements of a patterned wafer during the fabrication sequence has been developed. A flat, powerful rare-earth magnet provides the magnetic field required. The wafer need only have van der Pauw patterns available for on-wafer measurement capability. Measurement of room temperature Hall mobility can quickly and easily be obtained, making possible detailed study of carrier concentration and mobility variations during wafer fabrication." @default.
- W4253162823 created "2022-05-12" @default.
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- W4253162823 date "1991-06-01" @default.
- W4253162823 modified "2023-10-05" @default.
- W4253162823 title "On‐wafer Hall‐effect measurement system" @default.
- W4253162823 cites W2009067365 @default.
- W4253162823 doi "https://doi.org/10.1063/1.1142405" @default.
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