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• W4255221667 endingPage "13" @default.
• W4255221667 startingPage "1" @default.
• W4255221667 abstract "The fabrication of microelectronic circuits depends decisively on the use of lithography. The main steps of this technique are the irradiation and the development of a thin radiation sensitive film — the resist — deposited onto a silicon substrate. The irradiation by visible light, uv, x rays or electrons changes the solubility of the resist film in the developing medium and enables in this way the transfer of information from the mask onto the resist film. The structured resist film itself serves in turn as a stencil for transferring the resist film pattern onto the silicon substrate." @default.
• W4255221667 created "2022-05-12" @default.
• W4255221667 creator A5090456760 @default.
• W4255221667 date "1990-01-01" @default.
• W4255221667 modified "2023-09-28" @default.
• W4255221667 title "Introduction" @default.
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• W4255221667 doi "https://doi.org/10.1007/978-3-322-83103-3_1" @default.
• W4255221667 hasPublicationYear "1990" @default.
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