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• W4282912786 abstract "Atomic layer deposition (ALD) allows for fine control over the thickness, stoichiometry, and structural defects of materials. ALD provides a suitable route to deposit lead halides, which can further be converted to perovskites for photovoltaics, photoemission, and photodetection, among other applications. Deposition of lead halides by ALD has already begun to be explored; however, the precursors used in published processes are highly hazardous, require expensive fabrication processes, or contain impurities that can jeopardize the optoelectronic properties of metal halide perovskites after conversion. In this work, we deposited lead iodide (PbI2) by a facile ALD process involving only two readily accessible and low-cost precursors. PbI2 nanocrystals were grown on soda-lime glass (SLG), silicon dioxide support grids, and silicon wafer substrates and provided the groundwork for further investigation into developing lead halide perovskite processes by ALD. The ALD-grown PbI2 was characterized by annular dark-field scanning transmission electron microscopy (ADF-STEM), atomic force microscopy (AFM), high resolution transmission electron microscopy (HRTEM), X-ray fluorescence (XRF), and X-ray photoemission spectroscopy (XPS), among other methods. This work presents the first step to synthesize lead halide perovskites with atomic control for applications such as interfacial layers in photovoltaics and for deposition in microcavities for lasing." @default.
• W4282912786 created "2022-06-16" @default.
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• W4282912786 date "2022-03-08" @default.
• W4282912786 modified "2023-10-17" @default.
• W4282912786 title "PbI₂ Nanocrystal Growth by Atomic Layer Deposition from Pb(tmhd)₂ and HI" @default.
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• W4282912786 doi "https://doi.org/10.1021/acs.chemmater.1c03093" @default.
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