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- W4286571869 abstract "We clarified the effect of band edge states on the Coulomb-limiting electron mobility in Si n-MOSFETs operated at cryogenic temperatures, for the first time, by employing various surface orientations to produce different oxide-Si interface states. The Coulomb-limiting electron mobility of the (100)-, (120)-, and (110)-oriented Si n-MOSFETs differed significantly below 100 K. This was found to occur near the temperature at which the Fermi level starts to pass high-density localized charge-trap states located below the conduction band edge, for inverting the channel. An awareness of the role of band edge states with regard to cryogenic MOSFET operation, which is not a concern during conventional operation, is important." @default.
- W4286571869 created "2022-07-22" @default.
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- W4286571869 date "2022-06-12" @default.
- W4286571869 modified "2023-09-27" @default.
- W4286571869 title "Effect of Conduction Band Edge States on Coulomb-Limiting Electron Mobility in Cryogenic MOSFET Operation" @default.
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- W4286571869 doi "https://doi.org/10.1109/vlsitechnologyandcir46769.2022.9830505" @default.
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