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- W4286648384 abstract "Pulsed inductively coupled plasmas (ICPs) sustained in attaching gas mixtures are used for etching in microelectronics fabrication. Capacitive-to-inductive (E-H) mode transitions often occur at the start of each pulse due to the decrease in electron density produced by the attaching gas mixture during post pulse afterglow. In practice, even in the steady state, there is a mixed E-H mode. Over some range of operating conditions, a particular startup instability may occur in which certain pulses produce an anomalously high plasma density. In this work, the results from a computational investigation using the Hybrid Plasma Equipment Model (HPEM) of E-H mode transitions in pulsed ICPs sustained in Ar/Cl 2 mixtures are discussed to provide insights to these pulse-periodic instabilities. Base case operating conditions are Ar/Cl 2 gas mixtures, 25 mTorr with a pulse repetition frequency of 13.33 kHz, 30% duty cycle, and 350 W average power. We found the pulse-to-pulse instability occurs in systems with higher ratios of Cl 2 to Ar, where the instability appears with different pulse-to-pulse patterns depending on the gas mixture. Comparing Ar/Cl 2 to other electronegative mixtures such as Ar/O 2 indicates that the instability may be a function of the electron energy dependent rates of attachment during the afterglow." @default.
- W4286648384 created "2022-07-23" @default.
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- W4286648384 date "2022-05-22" @default.
- W4286648384 modified "2023-10-16" @default.
- W4286648384 title "Pulse-To-Pulse Instabilities During E-H Transitions in AR/CL<sub>2</sub> Inductively Coupled Plasmas" @default.
- W4286648384 doi "https://doi.org/10.1109/icops45751.2022.9813235" @default.
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