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- W4288690989 abstract "This work aims to demonstrate a facile method for the controlled orientation of nanostructures of block copolymer (BCP) thin films. A simple diblock copolymer system, polystyrene-block-polydimethylsiloxane (PS-b-PDMS), is chosen to demonstrate vacuum-driven orientation for solving the notorious low-surface-energy problem of silicon-based BCP nanopatterning. By taking advantage of the pressure dependence of the surface tension of polymeric materials, a neutral air surface for the PS-b-PDMS thin film can be formed under a high vacuum degree (∼10–4 Pa), allowing the formation of the film-spanning perpendicular cylinders and lamellae upon thermal annealing. In contrast to perpendicular lamellae, a long-range lateral order for forming perpendicular cylinders can be efficiently achieved through the self-alignment mechanism for induced ordering from the top and bottom of the free-standing thin film." @default.
- W4288690989 created "2022-07-30" @default.
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- W4288690989 date "2022-07-29" @default.
- W4288690989 modified "2023-10-18" @default.
- W4288690989 title "Vacuum-Driven Orientation of Nanostructured Diblock Copolymer Thin Films" @default.
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- W4288690989 doi "https://doi.org/10.1021/acsnano.2c04368" @default.
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