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- W4292829279 abstract "Endpoint detection technology plays an important role in chemical mechanical polishing (CMP) technology, and is affected by many aspects in the actual production process. Because the Endpoint curve can directly reflect the process information, in-depth study of the endpoint curve can predict the health of the process in advance. Taking the AMAT machine as an example, this paper focuses on the influence mechanism of Cu CMP incoming profile such as CU loading on Endpoint, and discusses how to improve endpoint stability to reduce the probability of endpoint capture failure." @default.
- W4292829279 created "2022-08-24" @default.
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- W4292829279 date "2022-06-20" @default.
- W4292829279 modified "2023-10-16" @default.
- W4292829279 title "Study on the Correlation Between CMP CU Loading and EDP Curve" @default.
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- W4292829279 doi "https://doi.org/10.1109/cstic55103.2022.9856829" @default.
- W4292829279 hasPublicationYear "2022" @default.
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