Matches in SemOpenAlex for { <https://semopenalex.org/work/W4293697954> ?p ?o ?g. }
Showing items 1 to 95 of
95
with 100 items per page.
- W4293697954 endingPage "106502" @default.
- W4293697954 startingPage "106502" @default.
- W4293697954 abstract "Abstract In lithography, resist patterns are fabricated through chemical reactions induced by radiation. In the highly resolving lithography such as extreme ultraviolet (EUV) lithography, the stochastically generated defects (stochastic defects) are a serious concern. In this study, the variation of resist polymer caused by stochastic effects was investigated, assuming line-and-space resist patterns to assess the defect risks. Using a half pitch HP, a thermalization distance r 0 , a total sensitizer concentration C s , and an initial standard deviation of the number of protected units per polymer molecule σ i as variables, the resist pattern formation was simulated on the basis of the reaction mechanisms of chemically amplified EUV resists. The frequency distribution of polymer molecules with the given number of protected units was calculated at the centers of lines and spaces. By defining a total defect risk (the sum of pinching and bridging risks), its dependences on HP, r 0 , C s , and σ i were clarified." @default.
- W4293697954 created "2022-08-31" @default.
- W4293697954 creator A5090399440 @default.
- W4293697954 date "2022-09-21" @default.
- W4293697954 modified "2023-09-26" @default.
- W4293697954 title "Theoretical study on defect risks of chemically amplified resists used for extreme ultraviolet lithography" @default.
- W4293697954 cites W1977535257 @default.
- W4293697954 cites W1983550027 @default.
- W4293697954 cites W1985405176 @default.
- W4293697954 cites W1991872585 @default.
- W4293697954 cites W1993096832 @default.
- W4293697954 cites W1996765591 @default.
- W4293697954 cites W2000443839 @default.
- W4293697954 cites W2002357496 @default.
- W4293697954 cites W2004257473 @default.
- W4293697954 cites W2006900277 @default.
- W4293697954 cites W2007980058 @default.
- W4293697954 cites W2011427720 @default.
- W4293697954 cites W2014122027 @default.
- W4293697954 cites W2024048367 @default.
- W4293697954 cites W2024392449 @default.
- W4293697954 cites W2026510778 @default.
- W4293697954 cites W2027253590 @default.
- W4293697954 cites W2039473729 @default.
- W4293697954 cites W2043931897 @default.
- W4293697954 cites W2047603600 @default.
- W4293697954 cites W2052439749 @default.
- W4293697954 cites W2071551540 @default.
- W4293697954 cites W2085867055 @default.
- W4293697954 cites W2088538686 @default.
- W4293697954 cites W2104254021 @default.
- W4293697954 cites W3007386645 @default.
- W4293697954 cites W4225300983 @default.
- W4293697954 doi "https://doi.org/10.35848/1347-4065/ac8dd1" @default.
- W4293697954 hasPublicationYear "2022" @default.
- W4293697954 type Work @default.
- W4293697954 citedByCount "2" @default.
- W4293697954 countsByYear W42936979542023 @default.
- W4293697954 crossrefType "journal-article" @default.
- W4293697954 hasAuthorship W4293697954A5090399440 @default.
- W4293697954 hasConcept C113196181 @default.
- W4293697954 hasConcept C120665830 @default.
- W4293697954 hasConcept C121332964 @default.
- W4293697954 hasConcept C146024833 @default.
- W4293697954 hasConcept C159985019 @default.
- W4293697954 hasConcept C162996421 @default.
- W4293697954 hasConcept C171250308 @default.
- W4293697954 hasConcept C178790620 @default.
- W4293697954 hasConcept C185592680 @default.
- W4293697954 hasConcept C192562407 @default.
- W4293697954 hasConcept C204223013 @default.
- W4293697954 hasConcept C2776798109 @default.
- W4293697954 hasConcept C2779227376 @default.
- W4293697954 hasConcept C49040817 @default.
- W4293697954 hasConcept C520434653 @default.
- W4293697954 hasConcept C521977710 @default.
- W4293697954 hasConcept C53524968 @default.
- W4293697954 hasConceptScore W4293697954C113196181 @default.
- W4293697954 hasConceptScore W4293697954C120665830 @default.
- W4293697954 hasConceptScore W4293697954C121332964 @default.
- W4293697954 hasConceptScore W4293697954C146024833 @default.
- W4293697954 hasConceptScore W4293697954C159985019 @default.
- W4293697954 hasConceptScore W4293697954C162996421 @default.
- W4293697954 hasConceptScore W4293697954C171250308 @default.
- W4293697954 hasConceptScore W4293697954C178790620 @default.
- W4293697954 hasConceptScore W4293697954C185592680 @default.
- W4293697954 hasConceptScore W4293697954C192562407 @default.
- W4293697954 hasConceptScore W4293697954C204223013 @default.
- W4293697954 hasConceptScore W4293697954C2776798109 @default.
- W4293697954 hasConceptScore W4293697954C2779227376 @default.
- W4293697954 hasConceptScore W4293697954C49040817 @default.
- W4293697954 hasConceptScore W4293697954C520434653 @default.
- W4293697954 hasConceptScore W4293697954C521977710 @default.
- W4293697954 hasConceptScore W4293697954C53524968 @default.
- W4293697954 hasFunder F4320320912 @default.
- W4293697954 hasIssue "10" @default.
- W4293697954 hasLocation W42936979541 @default.
- W4293697954 hasOpenAccess W4293697954 @default.
- W4293697954 hasPrimaryLocation W42936979541 @default.
- W4293697954 hasRelatedWork W1996211766 @default.
- W4293697954 hasRelatedWork W2017559628 @default.
- W4293697954 hasRelatedWork W2021976234 @default.
- W4293697954 hasRelatedWork W2028023447 @default.
- W4293697954 hasRelatedWork W2034439267 @default.
- W4293697954 hasRelatedWork W2077918349 @default.
- W4293697954 hasRelatedWork W2087075058 @default.
- W4293697954 hasRelatedWork W3053914760 @default.
- W4293697954 hasRelatedWork W3186960831 @default.
- W4293697954 hasRelatedWork W2013519709 @default.
- W4293697954 hasVolume "61" @default.
- W4293697954 isParatext "false" @default.
- W4293697954 isRetracted "false" @default.
- W4293697954 workType "article" @default.