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- W4294653700 abstract "A detailed electrical characterization and transistor parameter extraction on 200 mm CMOS compatible GaN/Si HEMTs was performed down to deep cryogenic temperatures. The main transistor parameters (threshold voltage Vth, low-field mobility μ0, subthreshold swing SS, source-drain series resistance Rsd) were extracted in linear region using the Y-function and the Lambert-W function methods for gate lengths down to 0.1 µm. The Y-function method was also employed in saturation region for the extraction of the saturation velocity. The results indicate that these GaN/Si HEMT devices demonstrate a very good functionality down to very low temperature with improvement of mobility and subthreshold slope. It was also shown by TLM analysis that the source-drain series resistance Rsd is more limited by the contact resistance than by the 2DEG access region resistance as temperature is lowered." @default.
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- W4294653700 date "2022-11-01" @default.
- W4294653700 modified "2023-10-18" @default.
- W4294653700 title "Detailed electrical characterization of 200 mm CMOS compatible GaN/Si HEMTs down to deep cryogenic temperatures" @default.
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- W4294653700 doi "https://doi.org/10.1016/j.sse.2022.108448" @default.
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