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- W4295048395 abstract "There is a significantly increasing demand of developing augmented reality and virtual reality (AR and VR) devices, where micro-LEDs (μLEDs) with a dimension of ≤ 5 μm are the key elements. Typically, μLEDs are fabricated by dry-etching technologies, unavoidably leading to a severe degradation in optical performance as a result of dry-etching induced damages. This becomes a particularly severe issue when the dimension of LEDs is ≤ 10 μm. In order to address the fundamental challenge, the Sheffield team has proposed and then developed a direct epitaxial approach to achieving μLEDs, where the dry-etching technologies for the formation of μLED mesas are not needed anymore. This paper provides a review on this technology and then demonstrates a number of monolithically integrated devices on a single chip using this technology." @default.
- W4295048395 created "2022-09-09" @default.
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- W4295048395 date "2023-01-01" @default.
- W4295048395 modified "2023-10-12" @default.
- W4295048395 title "Review of a direct epitaxial approach to achieving micro–LEDs" @default.
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- W4295048395 doi "https://doi.org/10.1088/1674-1056/ac90b5" @default.
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