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- W4298141165 abstract "In this experimental work titanium aluminium nitride (TiAlN) has been successfully synthesized over silicon substrate (p-type c-Si (100)) by chemical vapour deposition (CVD) process. The EDS results confirm presence of residual O2 in coating. Composition wise Ti is found to be maximum followed by Al and N. The morphological analysis by SEM confirms the formation of smooth coating whereas AFM analysis helps to determine the particle size of TiAlN coating. The coating thickness is around 7 µm. XRD analysis confirms the presence (111), (200), (220) and (311) crystal planes. Different nanomechanical properties of TiAlN coating have been determined by nanoindentation process and it has been found that the hardness and Young’s modulus of TiAlN coating are 32.97 and 277.98 GPa, respectively. The data analysis of TiAlN coating has been done by Origin 9.0 software." @default.
- W4298141165 created "2022-10-01" @default.
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- W4298141165 date "2022-10-01" @default.
- W4298141165 modified "2023-10-17" @default.
- W4298141165 title "Structural, Morphological and Mechanical Property Analysis of TiAlN Thin Film Coating Deposited by CVD Technique" @default.
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- W4298141165 doi "https://doi.org/10.1007/978-981-19-4388-1_36" @default.
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