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- W4298325617 abstract "In this work, the hafnium oxynitride (HfON) nanorod films on p-type silicon (Si) wafer substrate have been fabricated by reactive magnetron sputtering with glancing angle deposition (GLAD) technique, subsequently with a rapid thermal oxidation process at 500–900 °C under low-vacuum state. The crystallinity and morphology were investigated by glazing-incident X-ray diffraction (GIXRD) and field-emission scanning electron microscopy (FE-SEM), respectively. As-deposited films were amorphous nanorod films. The surface-sensitive X-ray photoelectron spectroscopy (XPS) analytical technique revealed that nitrogen atoms are increasingly replaced with oxygen atoms at the surface. The distribution of nitrogen atoms investigated by X-ray absorption spectroscopy (XAS) revealed the substitution of nitrogen with oxygen at the film surface and molecular nitrogen trapped in the film as the annealing temperature was increased." @default.
- W4298325617 created "2022-10-02" @default.
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- W4298325617 date "2023-01-01" @default.
- W4298325617 modified "2023-10-01" @default.
- W4298325617 title "Formation of HfOxNy nanorod GLAD films growth by rapid thermal oxidation" @default.
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- W4298325617 doi "https://doi.org/10.1016/j.vacuum.2022.111563" @default.
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