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- W4299367669 abstract "the ease with which a stoichiometric compound is formed. Copper sulfide coatings about 0.15-..mu..m thick were deposited by reactive sputtering from a copper cylindrical-post magnetron sputtering source in an Ar-H/sub 2/S atmosphere. The coating resistivity increased by more than six orders of magnitude with increasing H/sub 2/S injection rate. However, above a critical injection rate the resistivity data indicate two types of materials: a high-resistivity type (approx. 100 ..cap omega..-cm) often exhibiting Cu-rich surface nodules, and a low-resistivity type (approx. zero ..cap omega..-cm). Hall mobilities were in the 1 to 6 cm/sup 2//V-s range for both materials. Optical absorption, resistivity-versus-temperature, and x-ray diffraction measurements indicate that the high resistivity material consists largely of near stoichiometric, chalcocite, possibly stabilized by the excess copper and that the low resistivity material is a mixture of chalcocite and djurleite. Resistivity of CdS and Cd/sub 1-x/Zn/sub x/S films could be controlled by In doping. The all-vacuum photovoltaic junctions deposited to date have displayed V/sub oc/ approx. = 0.3 V." @default.
- W4299367669 created "2022-10-02" @default.
- W4299367669 date "1978-09-28" @default.
- W4299367669 modified "2023-09-26" @default.
- W4299367669 title "Cadmium sulfide/copper sulfide heterojunction cell research. Technical progress report No. 4, June 1, 1978-August 31, 1978" @default.
- W4299367669 doi "https://doi.org/10.2172/5720423" @default.
- W4299367669 hasPublicationYear "1978" @default.
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