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- W4301805935 abstract "The deposition of Al film onto the (111) surface of a p-Si crystal was shown to induce a deformation in the near-surface layer of the latter. Provided that the crystal strain is elastic and uniaxial, the gettering of defects in the near-surface layer is observed, which is confirmed by a change in the dependence of the specimen resistance on the elastic strain magnitude. The maximum depth of the defect capture has been calculated on the basis of the energy of interaction between the deformed layer and dislocations." @default.
- W4301805935 created "2022-10-05" @default.
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- W4301805935 date "2013-09-04" @default.
- W4301805935 modified "2023-09-27" @default.
- W4301805935 title "Electrophysical characteristics of near-surface layers in p-Si crystals with sputtered Al films and subjected to elastic deformation" @default.
- W4301805935 doi "https://doi.org/10.48550/arxiv.1309.0983" @default.
- W4301805935 hasPublicationYear "2013" @default.
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