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• W4307834150 abstract "The doping of Si using the scanning probe hydrogen depassivation lithography technique has been shown to enable placing and positioning small numbers of P atoms with nanometer accuracy. Several groups have now used this capability to build devices that exhibit desired quantum behavior determined by their atomistic details. What remains elusive, however, is the ability to control the precise number of atoms placed at a chosen site with 100% yield, thereby limiting the complexity and degree of perfection achievable. As an important step toward precise control of dopant number, we explore the adsorption of the P precursor molecule, phosphine, into atomically perfect dangling bond patches of intentionally varied size consisting of three adjacent Si dimers along a dimer row, two adjacent dimers, and one single dimer. Using low temperature scanning tunneling microscopy, we identify the adsorption products by generating and comparing to a catalog of simulated images, explore atomic manipulation after adsorption in select cases, and follow up with incorporation of P into the substrate. For one-dimer patches, we demonstrate that manipulation of the adsorbed species leads to single P incorporation in 12 out of 12 attempts. Based on the observations made in this study, we propose this one-dimer patch method as a robust approach that can be used to fabricate devices where it is ensured that each site of interest has exactly one P atom." @default.
• W4307834150 created "2022-11-06" @default.
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• W4307834150 date "2022-11-01" @default.
• W4307834150 modified "2023-09-24" @default.
• W4307834150 title "Enhanced Atomic Precision Fabrication by Adsorption of Phosphine into Engineered Dangling Bonds on H–Si Using STM and DFT" @default.
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• W4307834150 doi "https://doi.org/10.1021/acsnano.2c08162" @default.
• W4307834150 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/36317737" @default.
• W4307834150 hasPublicationYear "2022" @default.
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