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- W4307954750 startingPage "111305" @default.
- W4307954750 abstract "Films for bipolar plates deposited from PVD are always restricted by narrow parameters’ widow, which restrict the robust quality of high conductivity and anticorrosion due to the fluctuation of deposition plasma naturally. In this study, CrN films with high conductivity and strong corrosion resistance was deposited on Ti plates by high power impulse magnetron sputtering in wider Ar/N2 ratios. The results show that the CrN film prepared by this method effectively inhibits the columnar structure and forms a dense structure of amorphous wrapped nano Cr2N clusters, providing good protection for Ti plate. Meanwhile, First-principal calculations shown Cr2N has stronger metallicity than CrN, resulting in lower ICR. This work has opened up a new way for the large-scale preparation of metal bipolar plate films." @default.
- W4307954750 created "2022-11-06" @default.
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- W4307954750 date "2022-12-01" @default.
- W4307954750 modified "2023-09-27" @default.
- W4307954750 title "Nano-Cr2N dominated films with high conductivity and strong corrosion resistance for Ti bipolar plates" @default.
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- W4307954750 doi "https://doi.org/10.1016/j.matdes.2022.111305" @default.
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