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- W4308204017 abstract "Abstract In this paper, the influence mechanism of O 2 /H 2 O/CO 2 on the removal of CH 4 and NO x by non-thermal plasma (NTP) combined with selective catalytic reduction of NO x by CH 4 (NTP-CH 4 -SCR) were investigated. The results show that the increase of NTP energy density (0 J/L-491 J/L) promoted the CH 4 removal but inhibited the NO x removal in NTP-CH 4 -SCR. In CH 4 -SCR, H 2 O could significantly reduce catalyst activity, adding 0.5% H 2 O decreased the removal efficiency of CH 4 and NO x from 30–2.9% and 58.4–1.8% respectively. In NTP-CH 4 -SCR, the increase of H 2 O content (0.5%-10.4%) contributed to formation of oxidizing free radicals such as OH and HO 2 , thus the CH 4 removal efficiency increased from 24.1–37.4%. The increase of O 2 content (0%-10%) promoted the adsorption of NO and the reaction of adsorption products with CH 4 oxidation products, causing the CH 4 removal efficiency increased from 1.3–32.3% and NO x removal efficiency increased from 1.5–61.6% in CH 4 -SCR. Increasing O 2 (0–10%) produced more O and HO 2 radicals in NTP-CH 4 -SCR, resulting in the increase of CH 4 removal efficiency from 18.6–44.9%. However, these O and HO 2 radicals would react with N radicals to form NO 2 , NO 3 et al., thus decreasing NO x removal efficiency from 68–40.8%. The change of CO 2 concentration has little effect on CH 4 and NO x removal efficiency." @default.
- W4308204017 created "2022-11-09" @default.
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- W4308204017 date "2022-11-04" @default.
- W4308204017 modified "2023-10-14" @default.
- W4308204017 title "Study on Effect of O 2 /H 2 O on CH 4 and NO x Removal with NTP" @default.
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- W4308204017 doi "https://doi.org/10.21203/rs.3.rs-2215651/v1" @default.
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