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- W4308790716 abstract "Multi-beam mask writer MBM-2000PLUS has been released for the 3nm+ technology node. It is designed with the capability of low dose sensitivity resist over 150 uC/cm^2 in the writing of leading-edge EUV and optical blanks without constraint by beam exposure time. Furthermore, taking advantage of multi-beam writing strategy and its high beam current density, ultra-high throughput writing is also available by selective pixel size. This selective pixel size will make it possible to product both leading edge and middle grade masks efficiently. In this paper, the relation between the pixel size, throughput and precision is discussed and demonstrated by writing experiments in MBM-2000PLUS." @default.
- W4308790716 created "2022-11-15" @default.
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- W4308790716 date "2022-11-11" @default.
- W4308790716 modified "2023-09-26" @default.
- W4308790716 title "Selective leading-edge mask writing and high-throughput mask writing in multi-beam mask writer MBM-2000PLUS" @default.
- W4308790716 doi "https://doi.org/10.1117/12.2641449" @default.
- W4308790716 hasPublicationYear "2022" @default.
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