Matches in SemOpenAlex for { <https://semopenalex.org/work/W4308831820> ?p ?o ?g. }
Showing items 1 to 100 of
100
with 100 items per page.
- W4308831820 abstract "Abstract Nickel nanoparticles doped amorphous diamond-like carbon were sputtered by the RF-PECVD technique in different applied powers. Subsequently, the Effect of increasing RF power on the surface texture and conduction mechanism was analyzed and reported. EDAX spectroscopy implies the growth of nickel and carbon content. Scanning Electron Microscopy (SEM) shows that the nanoparticles of Ni-DLC within the increasing applied power were more agglomerated and homogenized. Electrical measurements were done to launch a full investigation into the charge transport mechanism of films and determine the type of transportation mechanism in the temperature range from 123 K to 573 K. Based on the electrical properties, using the Arrhenius model in the high-temperature ranges from 573 K to ~ 380 K, S 3 samples have a minimum value of inter-band activation energy about of 6 meV, indicating more conduction due to more nickel content compared to the other samples which can be a reason based on an argument that the nickel content could be controlled by regulating different RF applying deposition power, while in low-temperature range the conduction mechanism follows a phonon-assistant hopping. This research revealed that in Ni:a-C:H semiconductor thin films the adopted mechanism in the low-temperature region (VRH conduction mechanism) is different from the high-temperature one (band-to-band conduction) and changes from the VRH to the band-to-band conduction with rising temperature. Furthermore, by increasing the nickel content, the hopping distance was reduced in the samples." @default.
- W4308831820 created "2022-11-16" @default.
- W4308831820 creator A5020700291 @default.
- W4308831820 creator A5030056043 @default.
- W4308831820 creator A5013152660 @default.
- W4308831820 date "2022-11-12" @default.
- W4308831820 modified "2023-10-17" @default.
- W4308831820 title "Characterizing the influence of various RF powers of Sputtering system on the electrical properties of Ni-DLC semiconductor thin films" @default.
- W4308831820 cites W1966372357 @default.
- W4308831820 cites W1974922571 @default.
- W4308831820 cites W1982743546 @default.
- W4308831820 cites W1983175414 @default.
- W4308831820 cites W1989888844 @default.
- W4308831820 cites W1995716968 @default.
- W4308831820 cites W1996682084 @default.
- W4308831820 cites W2036302370 @default.
- W4308831820 cites W2048334148 @default.
- W4308831820 cites W2050691412 @default.
- W4308831820 cites W2059614307 @default.
- W4308831820 cites W2068934995 @default.
- W4308831820 cites W2088421671 @default.
- W4308831820 cites W2132313801 @default.
- W4308831820 cites W2343820024 @default.
- W4308831820 cites W2768135276 @default.
- W4308831820 cites W4206634178 @default.
- W4308831820 doi "https://doi.org/10.21203/rs.3.rs-2256419/v1" @default.
- W4308831820 hasPublicationYear "2022" @default.
- W4308831820 type Work @default.
- W4308831820 citedByCount "0" @default.
- W4308831820 crossrefType "posted-content" @default.
- W4308831820 hasAuthorship W4308831820A5013152660 @default.
- W4308831820 hasAuthorship W4308831820A5020700291 @default.
- W4308831820 hasAuthorship W4308831820A5030056043 @default.
- W4308831820 hasBestOaLocation W43088318201 @default.
- W4308831820 hasConcept C108225325 @default.
- W4308831820 hasConcept C108599883 @default.
- W4308831820 hasConcept C113196181 @default.
- W4308831820 hasConcept C119599485 @default.
- W4308831820 hasConcept C121332964 @default.
- W4308831820 hasConcept C127413603 @default.
- W4308831820 hasConcept C159985019 @default.
- W4308831820 hasConcept C171250308 @default.
- W4308831820 hasConcept C172100665 @default.
- W4308831820 hasConcept C178790620 @default.
- W4308831820 hasConcept C185592680 @default.
- W4308831820 hasConcept C19067145 @default.
- W4308831820 hasConcept C191897082 @default.
- W4308831820 hasConcept C192562407 @default.
- W4308831820 hasConcept C22423302 @default.
- W4308831820 hasConcept C39353612 @default.
- W4308831820 hasConcept C43617362 @default.
- W4308831820 hasConcept C49040817 @default.
- W4308831820 hasConcept C504270822 @default.
- W4308831820 hasConcept C56052488 @default.
- W4308831820 hasConcept C69990965 @default.
- W4308831820 hasConcept C8010536 @default.
- W4308831820 hasConcept C86183883 @default.
- W4308831820 hasConcept C95121573 @default.
- W4308831820 hasConcept C97355855 @default.
- W4308831820 hasConceptScore W4308831820C108225325 @default.
- W4308831820 hasConceptScore W4308831820C108599883 @default.
- W4308831820 hasConceptScore W4308831820C113196181 @default.
- W4308831820 hasConceptScore W4308831820C119599485 @default.
- W4308831820 hasConceptScore W4308831820C121332964 @default.
- W4308831820 hasConceptScore W4308831820C127413603 @default.
- W4308831820 hasConceptScore W4308831820C159985019 @default.
- W4308831820 hasConceptScore W4308831820C171250308 @default.
- W4308831820 hasConceptScore W4308831820C172100665 @default.
- W4308831820 hasConceptScore W4308831820C178790620 @default.
- W4308831820 hasConceptScore W4308831820C185592680 @default.
- W4308831820 hasConceptScore W4308831820C19067145 @default.
- W4308831820 hasConceptScore W4308831820C191897082 @default.
- W4308831820 hasConceptScore W4308831820C192562407 @default.
- W4308831820 hasConceptScore W4308831820C22423302 @default.
- W4308831820 hasConceptScore W4308831820C39353612 @default.
- W4308831820 hasConceptScore W4308831820C43617362 @default.
- W4308831820 hasConceptScore W4308831820C49040817 @default.
- W4308831820 hasConceptScore W4308831820C504270822 @default.
- W4308831820 hasConceptScore W4308831820C56052488 @default.
- W4308831820 hasConceptScore W4308831820C69990965 @default.
- W4308831820 hasConceptScore W4308831820C8010536 @default.
- W4308831820 hasConceptScore W4308831820C86183883 @default.
- W4308831820 hasConceptScore W4308831820C95121573 @default.
- W4308831820 hasConceptScore W4308831820C97355855 @default.
- W4308831820 hasLocation W43088318201 @default.
- W4308831820 hasOpenAccess W4308831820 @default.
- W4308831820 hasPrimaryLocation W43088318201 @default.
- W4308831820 hasRelatedWork W1980704569 @default.
- W4308831820 hasRelatedWork W1987375706 @default.
- W4308831820 hasRelatedWork W1997937992 @default.
- W4308831820 hasRelatedWork W2043788690 @default.
- W4308831820 hasRelatedWork W2057698425 @default.
- W4308831820 hasRelatedWork W2090936768 @default.
- W4308831820 hasRelatedWork W2181867200 @default.
- W4308831820 hasRelatedWork W2313922225 @default.
- W4308831820 hasRelatedWork W2392753726 @default.
- W4308831820 hasRelatedWork W2618307771 @default.
- W4308831820 isParatext "false" @default.
- W4308831820 isRetracted "false" @default.
- W4308831820 workType "article" @default.