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- W4308991987 abstract "Nanoscale patterning of inorganics is crucial for the fabrication of advanced electronic, photonic, and energy devices. The emerging sequential infiltration synthesis (SIS) method fabricates nanofeatures by block-selective vapor-phase growth in block copolymer templates with tunable patterns. Yet, SIS has been demonstrated mainly for Al2O3 and a few other metal oxides, while deriving metal nanostructures from a single SIS process is a challenge. Here, we present SIS of the Ru metal in polystyrene-block-polymethyl methacrylate (PS-b-PMMA) templates without any pretreatment, using alternating infiltration of RuO4 and H2. RuO4 interacts selectively and strongly with the aromatic C═C and C–H groups in PS, leaving the PMMA domains inert. Density functional theory calculations corroborate that the PS–RuO4 interaction is energetically favorable, with a calculated interaction energy of −1.65 eV, whereas for PMMA–RuO4, the calculated energy of −0.05 eV indicates an unfavorable interaction. Morphological analysis on the di-BCP after the RuO4-H2 process indicates an increase in contrast as a function of SIS cycles and templated Ru incorporation. The crystalline nature of the Ru deposits is confirmed using grazing incidence wide-angle X-ray scattering. Plasma-aided removal of the organic components yields Ru nanolines with lateral dimensions of ca 20 nm. We further highlight the broad potential of RuO4 as a reactant for SIS by generating RuO2 nanopatterns via alternating RuO4 and methanol infiltration." @default.
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- W4308991987 date "2022-11-14" @default.
- W4308991987 modified "2023-09-23" @default.
- W4308991987 title "Spatially Templated Nanolines of Ru and RuO<sub>2</sub> by Sequential Infiltration Synthesis" @default.
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- W4308991987 doi "https://doi.org/10.1021/acs.chemmater.2c01866" @default.
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