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- W4310584445 abstract "Triple patterning lithography, is a practical method of layout manufacturing under advanced technology node. In triple patterning lithography, the most important thing is layout decomposition. In the process of layout decomposition, proper layout simplification can greatly improve the solving speed, but the simplification of these algorithms used in the industries now are not enough. In this paper, we proposed a new clustering algorithm to further reduce the scale of each conflict graph. Meanwhile, a new color adjustment algorithm between clusters are proposed to maintain or even reduce the decomposition cost. Experimental results show that the proposed algorithm with clustering can achieve an 11% decrease in decomposition cost, and a 26% improvement in solving speed compared with the algorithm without clustering, averagely." @default.
- W4310584445 created "2022-12-12" @default.
- W4310584445 creator A5060924736 @default.
- W4310584445 creator A5063020742 @default.
- W4310584445 date "2022-10-25" @default.
- W4310584445 modified "2023-09-29" @default.
- W4310584445 title "A Novel Triple Patterning Lithography Layout Decomposition Algorithm with Clustering" @default.
- W4310584445 cites W3067903889 @default.
- W4310584445 doi "https://doi.org/10.1109/icsict55466.2022.9963375" @default.
- W4310584445 hasPublicationYear "2022" @default.
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